HI-85-20-1 -- Ventilation of Hazardous Production Areas in Semiconductor Fabrication Facilities

HI-85-20-1 -- Ventilation of Hazardous Production Areas in Semiconductor Fabrication Facilities

Conference Proceeding published 1985 by ASHRAE

Written By R.V. Grout, P.E.; T.W. Mulkey, Jr., P.E.

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A number of potentially harmful processes and hazardous production semiconductor materials (HPM) are used in fabrication. Designing ventilating systems for these materials involves many safety considerations and other factors unique to the industry. Basic design criteria include the chemical classification of the HPM, the building-code classification of the areas of use, and the electrical classification of the areas. The ventilating systems must be designed to handle a variety of room pressurization conditions, as well as the specific requirements of the various process equipment to which a system may be connected. Other considerations include materials of construction, controls adequate to respond to accident and failure conditions, and ability to vent or convey flammable or otherwise reactive gases or vapors. Finally, the ventilating systems should be carefully integrated with the building air-conditioning, fire protection, electrical, environmental, and life-safety systems.

Units: SI

Citation: Symposium, ASHRAE Transactions, 1985, vol. 91, pt. 2B, Honolulu, HI

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